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Panasonic and Renesas Technology Collaborating on Development of SoCs at 32 nm Process Node: related news
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Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for SoCs of the 32-nm node. The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production. The 32-nm SoC process employs a developed transistor technology with a metal/high-k1 gate stack structure and interconnect technology, using a low-k2 material. To achieve a device using complementary metal-insulator semiconductor (CMIS)3 technology, a type of complementary Metal Oxide Semiconductor (CMOS), at a 32-nm node, an ultrathin film cap layer4 is applied at the atomic level to transistors with a metal/high-k gate stack structure under optimized conditions.
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via ECN Asia @ 12:37 24th Oct
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Building on their successful partnership on the joint process technology development since 1998, Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for SoCs of the next-generation 32-nm node. The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production.
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via Electronic Specifier @ 14:30 11th Oct
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TOKYO --(Business Wire)-- Building on the successful partnership on their joint process technology development since 1998, Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for systems-on-a-chip (SoCs) of the next-generation 32-nm node. The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production.
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via TMC Net @ 0:14 9th Oct
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TOKYO (Business Wire) -- Building on the successful partnership on their joint process technology development since 1998, Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for systems-on-a-chip (SoCs) of the next-generation 32-nm node. The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production.
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via Globe Investor @ 0:18 9th Oct
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Tokyo, Oct 9, 2008 - (JCN Newswire) - Building on their successful partnership on the joint process technology development since 1998, Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for SoCs of the next-generation 32-nm node. The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production.
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via JCN @ 7:29 9th Oct
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Building on the successful partnership on their joint process technology development since 1998, Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for systems-on-a-chip (SoCs) of the next-generation 32-nm node. The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production.
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via EDA Geek @ 7:29 9th Oct
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TOKYO - Building on the successful partnership on their joint process technology development since 1998, Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for systems-on-a-chip (SoCs) of the next-generation 32-nm
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via Earthtimes.org @ 0:17 9th Oct
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Building on the successful partnership on their joint process technology development since 1998, Panasonic Corporation and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for systems-on-a-chip (SoCs) of the next-generation 32-nm node. The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production.
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via Business Wire via MSN Money @ 0:18 9th Oct
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(RTTNews) - Panasonic Corp. (PC: News ) and Renesas Technology Corp., which was established in 2003 as a joint venture between Hitachi Ltd. (HIT: News ) and Mitsubishi Electric Corp., announced collaboration for the development of elemental process technologies for systems-on-a-chip or SoCs of the next-generation 32-nm node.
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via RTTNews.com @ 0:18 9th Oct
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October 10, 2008 -- Panasonic Corp. and Renesas Technology Corp. are collaborating on the development of elemental process technologies for system-on-chips (SOCs) of the next-generation 32-nm node.
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via SOCCentral.com @ 15:22 10th Oct
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Panasonic Corp and Renesas Technology Corp are collaborating on the development of elemental process technologies for SoCs of the next-generation 32nm node. Building on the partnership on their joint process technology development since 1998, the companies are confident that their 32nm node transistor technology and other advances can soon be applied to products in mass production.
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via Nikkei Business Publications @ 4:39 9th Oct
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Building on their partnership on the joint process technology development since 1998, Panasonic Corp. and Renesas Technology Corp. are now collaborating on the development of elemental process technologies for SoCs of the next-generation 32nm node. The two companies hope that their 32nm node transistor technology and other advances can soon be applied to products in mass production.
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via Electronic Engineering Times Asia @ 15:56 12th Oct
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via Azonano @ 4:43 9th Oct
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Panasonic and Renesas Technology are collaborating on the development of elemental process technologies for systems-on-a-chip (SoCs) of the next-generation 32nm node. The two companies expect their 32nm node transistor technology and other advances to be soon applied to products in mass production.
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via Digital Media Asia @ 0:16 10th Oct
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Jointly developing transistor and LSI interconnect technology for realizing low power consumption and high-speed signal processing capabilities -
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via EDA Café @ 6:50 17th Oct
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Jointly developing transistor and LSI interconnect technology for realizing low power consumption and high-speed signal processing capabilities—
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via Embedded Technology Journal @ 23:26 11th Oct
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Jointly Developing Transistor and LSI Interconnect Technology for Realizing Low Power Consumption and High-Speed Signal Processing Capabilities
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via IT Business Net @ 4:39 9th Oct
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Jointly Developing Transistor and LSI Interconnect Technology for Realizing Low Power Consumption and High-Speed Signal Processing Capabilities
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via Media Workstation @ 4:43 9th Oct
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Jointly Developing Transistor and LSI Interconnect Technology for Realizing Low Power Consumption and High-Speed Signal Processing Capabilities
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via Houston Chronicle @ 0:14 9th Oct
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Jointly Developing Transistor and LSI Interconnect Technology for Realizing Low Power Consumption and High-Speed Signal Processing Capabilities
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via MarketWatch @ 0:16 9th Oct
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Jointly Developing Transistor and LSI Interconnect Technology for Realizing Low Power Consumption and High-Speed Signal Processing Capabilities
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via Consumer Electronics Net @ 0:16 9th Oct
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Jointly Developing Transistor and LSI Interconnect Technology for Realizing Low Power Consumption and High-Speed Signal Processing Capabilities
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via Stockwatch @ 0:18 9th Oct
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via Street Insider @ 0:18 9th Oct
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Panasonic and Renesas Technology Jointly Developing Transistor and LSI Interconnect Technology for Realizing Low Power Consumption and High-Speed Signal Processing Capabilities
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via Chip Design Magazine @ 4:50 11th Oct
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Panasonic and Renesas Technology collaborate on development of SoCs at 32-nm Process Node - Quick Facts
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via RTTNews.com @ 1:01 3rd Nov
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